Abstract
Reaction pathways for complete decomposition of ammonia on the InN (0001) surface are investigated using first principles calculations. We show that while the initial NH 3 decomposition on this surface can proceed by H dissociation, its further decomposition is most favorable by H transfer. The calculated low diffusion barriers for the decomposed species on the surface imply that the metal-organic chemical vapor deposition growth of InN is a reaction-limited process rather than diffusion-limited at low adsorbate coverage. © 2012 American Institute of Physics.
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CITATION STYLE
Walkosz, W., Zapol, P., & Stephenson, G. B. (2012). A DFT study of reaction pathways of NH 3 decomposition on InN (0001) surface. Journal of Chemical Physics, 137(5). https://doi.org/10.1063/1.4739309
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