Can application technology help to manage pesticide resistance?

Abstract

Low and/or uneven spray deposits are frequently implicated in failure to control pests or diseases, but little is known about the resistance selection pressures imposed by such deposits. Overdosing represents inefficient pesticide use and may select for development of high levels of single gene resistance. Pest or disease exposure to low pesticide doses may select for development of polygenic resistance. Current application techniques are inefficient and this, coupled with trends to lower pesticide dose rates, will tend to increase pest and disease exposure to low pesticide doses. This paper highlights the spray deposit variability observed in New Zealand fruit crops and discusses this in the context of resistance management and opportunities to improve agrichemical targetting.