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Beam profile indicator for swift heavy ions using phosphor afterglow

AIP Advances (2012) 2(3)
DOI: 10.1063/1.4739407
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Abstract

In this letter, we report a beam profile indicator for swift heavy ions (SHIs) which utilizes the afterglow of phosphors. Clear marks are left on SrAl2O4:Eu2+ and CaSrAl2Si 2O8:Eu2+ samples by SHI irradiation through a permanent change of their afterglow intensity. The afterglow intensity of the SHI-irradiated areas has a Gaussian distribution. Moreover, afterglow intensity and irradiation fluence are linearly related, indicating that this type of indicator has good dose linearity. The results suggest that long-lasting phosphors are promising SHI beam profile indicators with high spatial resolution. Copyright 2012 Author(s).

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APA

Zhan, T. Z., Xu, C. N., Yamada, H., Terasawa, Y., Zhang, L., Iwase, H., & Kawai, M. (2012). Beam profile indicator for swift heavy ions using phosphor afterglow. AIP Advances, 2(3). https://doi.org/10.1063/1.4739407

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