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Optical lithography

CRC Press, (2012), 127-139
DOI: 10.1201/b11626
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Abstract

Optical lithography is a photon-based technique comprised of projecting, or shadow casting, an image into a photosensitive emulsion (photoresist) coated onto the substrate of choice. Today, it is the most widely used lithography process in the manufacturing of nanoelectronics by the semiconductor industry, a $200 billion industry worldwide.

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APA

Naulleau, P. (2012). Optical lithography. In Nanofabrication Handbook (pp. 127–139). CRC Press. https://doi.org/10.1201/b11626

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