Plasma deposition of thin carbonfluorine films on aligned carbon nanotube

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Abstract

The thin film of carbonfluorine was deposited on the surfaces of aligned carbon nanotubes using a plasma polymerization treatment. High-resolution transmission electron microscopy images revealed that a thin film of the polymer layer (20 nm) was uniformly deposited on the surfaces of the aligned carbon nanotubes. Time-of-flight secondary ion mass spectroscopy and Fourier transform infrared experiments identified the carbonfluorine thin films on the carbon nanotubes. The plasma deposition mechanism is discussed. © 2005 American Institute of Physics.

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APA

He, P., Shi, D., Lian, J., Wang, L. M., Ewing, R. C., Van Ooij, W., … Ren, Z. F. (2005). Plasma deposition of thin carbonfluorine films on aligned carbon nanotube. Applied Physics Letters, 86(4). https://doi.org/10.1063/1.1846957

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