Engineering of the topological magnetic moment of electrons in bilayer graphene using strain and electrical bias

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Abstract

The topological properties of electronic states in multivalley two-dimensional materials, such as mono- A nd bilayer graphene, or thin films of rhombohedral graphite give rise to various unusual magnetotransport regimes. Here, we investigate the tunability of the topological magnetic moment (related to the Berry curvature) of electronic states in bilayer graphene using strain and vertical bias. We show how one can controllably vary the valley g factor of the band-edge electrons gv∗ across the range 10 <200, and we discuss the manifestations of the topological magnetic moment in the anomalous contribution towards the Hall conductivity and in the Landau level spectrum.

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Moulsdale, C., Knothe, A., & Fal’ko, V. (2020). Engineering of the topological magnetic moment of electrons in bilayer graphene using strain and electrical bias. Physical Review B, 101(8). https://doi.org/10.1103/PhysRevB.101.085118

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