Effects of dielectric deposition on the electrical characteristics of MIM tunnel junctions

1Citations
Citations of this article
19Readers
Mendeley users who have this article in their library.

Abstract

In this research, the effects of varying the reactive gas ratio during insulator deposition of MIM junctions have been observed and studied. Junctions with 100×100 μm area have been realized using Ni-NiO-Cr electrodes for Rectenna application. The electrical properties of the tunnel junctions exhibited improved tunneling response with reduced O2 gas ratio. It is theorized that a surplus of O2 ions facilitates tunneling, as does a deficiency of O2 ions due to charge transport by ions or vacancies. The devices fabricated with 1:1 and 1:3 gas ratios both exhibited high electrical responses with the latter exhibiting higher, while 1:2 exhibited the lowest response, suggesting that an increased or decreased density of traps within the barrier results in changes in the tunneling current. The dependence of voltage linearity on trap-densities within a dielectric has been shown and is discussed in this article.

Author supplied keywords

Cite

CITATION STYLE

APA

Ratnadurai, R., Krishnan, S., Stefanakos, E., Goswami, D. Y., & Bhansali, S. (2010). Effects of dielectric deposition on the electrical characteristics of MIM tunnel junctions. In Procedia Engineering (Vol. 5, pp. 1059–1062). Elsevier Ltd. https://doi.org/10.1016/j.proeng.2010.09.292

Register to see more suggestions

Mendeley helps you to discover research relevant for your work.

Already have an account?

Save time finding and organizing research with Mendeley

Sign up for free