Abstract
We report the results of numerical simulation of nanoscale SOI structures under highly non-equilibrium conditions with the Density Gradient model. The simulations have been carried out with the general purpose device simulator DESSIS. We show that 2D quantum mechanical effects are important for the structures under investigation. We demonstrate that our implementation of the DG model is robust and enables efficient simulation far from equilibrium, for both the drift-diffusion and hydrodynamic transport model.
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Lyumkis, E., Mickevicius, R., Penzin, O., Polsky, B., El Sayed, K., Wettstein, A., & Fichtner, W. (2002). Simulations of ultrathin, ultrashort double-gated MOSFETs with the density gradient transport model. In International Conference on Simulation of Semiconductor Processes and Devices, SISPAD (Vol. 2002-January, pp. 271–274). Institute of Electrical and Electronics Engineers Inc. https://doi.org/10.1109/SISPAD.2002.1034570
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