Preparation and Properties of Organic-Inorganic Hybrid Antireflection Films Made by a Low-Temperature Process Using Hollow Silica Nanoparticles

Abstract

Layers made of hollow silica nanoparticles have potential applications as antireflection films with lower refractive index values compared with existing materials such as silica glass (1.50) and magnesium fluoride (1.38). The advantages of such nanoparticles result from interactions between the solid shell, the cavity phase core, and the voids between particles. To obtain practical antireflection films, it is necessary to control the number of layers of these hollow silica nanoparticles and to fill the gaps between particles with a solid. In the present study, antireflection films were prepared by applying a coating of hollow silica nanoparticles dispersed in a UV-curable monomer solution onto plastic substrates. After film formation and exposure to UV light, the voids between the nanoparticles were completely filled with a polymer matrix. Tuning the particle concentration in the coating solution allowed the formation of antireflection films comprising one to three layers of the hollow silica nanoparticles. The reflectance of the films was dependent on the number of layers, and a 100 nm thick film in which two layers of hollow silica nanoparticles were precisely arranged showed the lowest reflectance of 0.92% at 550 nm wavelength, equivalent to a refractive index of 1.23. Because the voids between particles were filled with the polymer, these films resisted contamination during manual handling and so would be expected to maintain low reflectance during practical applications. This work demonstrates that nanosized inorganic-organic hybrid films composed of hollow silica nanoparticles and a UV-curable resin can exhibit optical properties and structural integrity that cannot be achieved by either substance alone.