Influence of the current density and resistivity on the optical properties of p-type porous silicon thin films fabricated by the electrochemical anodizing method

Abstract

Porous Silicon thin films were produced in this work by the electrochemical anodizing method. The samples were fabricated anodizing p type Si substrates with different resistivities in hydrofluoric acid. Samples were prepared at different current densities. The films were characterized through reflectance and room photoluminescence (PL) measurements in the visible region. A simple theoretical model is proposed to calculate the Optical constants of the material using a theoretical simulation of the reflectance spectra. The maximum positions of PL signals are shifted to long wavelengths as the porosity increase in samples prepared with substrates of resistivities of 0.1 and 1 Ω-cm, while an opposite behaviour is observed in samples prepared on more doped substrates. The optical constants obtained through the calculation are the spectral variation of the refractive index and extinction coefficient, also are obtained the sample thickness and surface roughness.