Interstitial boron-doped anatase TiO2 thin-films on optical fibres: Atmospheric pressure-plasma enhanced chemical vapour deposition as the key for functional oxide coatings on temperature-sensitive substrates

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Abstract

Temperature sensitive poly(methyl methacrylate) (PMMA) optical fibres were coated with boron doped-anatase crystalline TiO2 thin films in a one-step atmospheric pressure-plasma enhanced chemical vapour deposition (AP-PECVD) process. Both the undoped and interstitial boron-doped TiO2 thin films showed photoactivity under UV irradiation, with the boron-doped thin films presenting higher photodegradation rates when compared to the undoped samples.

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Quesada-González, M., Baba, K., Sotelo-Vázquez, C., Choquet, P., Carmalt, C. J., Parkin, I. P., & Boscher, N. D. (2017). Interstitial boron-doped anatase TiO2 thin-films on optical fibres: Atmospheric pressure-plasma enhanced chemical vapour deposition as the key for functional oxide coatings on temperature-sensitive substrates. Journal of Materials Chemistry A, 5(22), 10836–10842. https://doi.org/10.1039/c7ta02029e

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