Near-field photochemical and radiation-induced chemical fabrication of nanopatterns of a self-assembled silane monolayer

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Abstract

© 2014 Fischer et al. A general concept for parallel near-field photochemical and radiation-induced chemical processes for the fabrication of nanopatterns of a self-assembled monolayer (SAM) of (3-aminopropyl)triethoxysilane (APTES) is explored with three different processes: 1) a near-field photochemical process by photochemical bleaching of a monomolecular layer of dye molecules chemically bound to an APTES SAM, 2) a chemical process induced by oxygen plasma etching as well as 3) a combined near-field UV-photochemical and ozone-induced chemical process, which is applied directly to an APTES SAM. All approaches employ a sandwich configuration of the surface-supported SAM, and a lithographic mask in form of gold nanostructures fabricated through colloidal sphere lithography (CL), which is either exposed to visible light, oxygen plasma or an UV-ozone atmosphere. The gold mask has the function to inhibit the photochemical reactions by highly localized near-field interactions between metal mask and SAM and to inhibit the radiation-induced chemical reactions by casting a highly localized shadow. The removal of the gold mask reveals the SAM nanopattern.

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Fischer, U. C., Hentschel, C., Fontein, F., Stegemann, L., Hoeppener, C., Fuchs, H., & Hoeppener, S. (2014). Near-field photochemical and radiation-induced chemical fabrication of nanopatterns of a self-assembled silane monolayer. Beilstein Journal of Nanotechnology, 5(1), 1441–1449. https://doi.org/10.3762/bjnano.5.156

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