Thickness Measurement of Photoresist Thin Films Using Interferometry

  • Kossivas F
  • Doumanidis C
  • Kyprianou A
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Abstract

Photoresists are polymers sensitive to light, usually in the ultraviolet (UV) range of the electromagnetic radiation spectrum. They are classified into positive and negative. In positive types, the exposed to light region of the photoresist becomes solvable to a ... <br />

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Kossivas, F., Doumanidis, C., & Kyprianou, A. (2012). Thickness Measurement of Photoresist Thin Films Using Interferometry. In Interferometry - Research and Applications in Science and Technology. InTech. https://doi.org/10.5772/34983

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