Vertical and smooth single-step reactive ion etching process for InP membrane waveguides

14Citations
Citations of this article
12Readers
Mendeley users who have this article in their library.

Abstract

In this paper we present a novel single-step RIE process for InP membrane optical waveguide etching. The optimization of the process is focused on the sidewall verticality and surface roughness of the etched profile. Significant improvement on the etched profile is achieved for the first time in a single-step RIE process. Loss measurement on fabricated membrane waveguides etched with the proposed RIE process results in a record low waveguide propagation loss (2.5 dB/cm).

Cite

CITATION STYLE

APA

Jiao, Y., Vries, T. D., Unger, R. S., Shen, L., Ambrosius, H., Radu, C., … Van Der Tol, J. (2015). Vertical and smooth single-step reactive ion etching process for InP membrane waveguides. Journal of the Electrochemical Society, 162(8), E90–E95. https://doi.org/10.1149/2.0371508jes

Register to see more suggestions

Mendeley helps you to discover research relevant for your work.

Already have an account?

Save time finding and organizing research with Mendeley

Sign up for free