VOx-undoped and Ti-doped thin films were deposited onto insulating support (either fused silica or alumina) by means of rf reactive sputtering from a metallic vanadium target with mosaic Ti. Film thickness was varied between 200-600 nm. Argon-oxygen gas mixtures of different compositions were used for sputtering. Structural properties and phase composition of as-sputtered thin films were studied by X-ray diffraction at glancing incidence, GIXD and Scanning Electronic Microscopy (SEM). Electrical properties were determined by means of impedance spectroscopy at temperatures from RT to 400°C. V2O5thin films exhibited good response towards hydrogen, methane and propane.
Schneider, K., Lubecka, M., & Czapla, A. (2015). VOxthin films for gas sensor applications: EUROSENSORS 2015. In Procedia Engineering (Vol. 120, pp. 1153–1157). Elsevier Ltd. https://doi.org/10.1016/j.proeng.2015.08.1009