Characteristics of carbon-related materials deposited in electron-energy controlled CH4/H2RF discharge plasmas

  • Emi J
  • Iizuka S
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Abstract

The influence of electron temperature Teon the production of carbon-related materials was investigated in a hollow-type magnetron radio-frequency (RF) CH4/H2plasma. Here, the electron temperature decreased along the plasma column. Since the dissociation of CH4is determined by the electron energy in plasmas, the density ratio of radicals CH2/CH3can be varied by the electron temperature. Therefore, the change of the electron temperature is quite important for controlling the characteristics of carbon-related materials. In the experiment, the production of diamond microparticles in low Teplasma was detected. On the other hand, thin carbon films consisting of graphitic carbons were observed in the high Teplasma. Therefore, it is shown that control of the electron temperature in the plasma has a key effect on the film quality. © 2011 Elsevier B.V.

Author-supplied keywords

  • Amorphous graphite
  • Diamond microparticle
  • Diamond-like carbon
  • Diamond-like carbons
  • Electron temperature control
  • Plasma CVD

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Authors

  • Junichi Emi

  • Satoru Iizuka

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