Two techniques, etched quartz and embedded materials, are commonly used today to fabricate attenuated phase shift masks (PSMs). This paper presents measurement results on the masks and wafers to compare their lithography performance. © 1995 Elsevier Science B.V. All rights reserved.
Yuan, C. M., & Pol, V. (1995). Comparisons of attenuated PSM technologies using etched quartz and embedded materials. Microelectronic Engineering, 27(1–4), 251–253. https://doi.org/10.1016/0167-9317(94)00100-9