Comparisons of attenuated PSM technologies using etched quartz and embedded materials

  • Yuan C
  • Pol V
  • 1

    Readers

    Mendeley users who have this article in their library.
  • 1

    Citations

    Citations of this article.

Abstract

Two techniques, etched quartz and embedded materials, are commonly used today to fabricate attenuated phase shift masks (PSMs). This paper presents measurement results on the masks and wafers to compare their lithography performance. © 1995 Elsevier Science B.V. All rights reserved.

Get free article suggestions today

Mendeley saves you time finding and organizing research

Sign up here
Already have an account ?Sign in

Find this document

Authors

  • Chi Min Yuan

  • Victor Pol

Cite this document

Choose a citation style from the tabs below

Save time finding and organizing research with Mendeley

Sign up for free