A new method to fabricate hybrid micro-optical elements in one-step lithography is proposed in this paper. A gray-tone coding method has been developed to achieve one step photolithography of achromatic hybrid micro-optical elements. Design and simulation of hybrid lens with grey-tone mask are presented. The aberrations of optical elements are pre-corrected in the lithography process. The operating range of the hybrid optical element is in infrared band (8.0∼12.0 μm) with the central wavelength at 10.6 μm. © 2001 Elsevier Science B.V. All rights reserved.
Yao, J., Cui, Z., Gao, F., Zhang, Y., Du, J., Su, J., & Guo, Y. (2001). Design of hybrid micro optical elements with coded gray-tone mask. Microelectronic Engineering, 57–58, 793–799. https://doi.org/10.1016/S0167-9317(01)00493-2