Development of compatible wet-clean stripper for integration of CoWP metal cap in Cu/low-k interconnects

  • Wu A
  • Baryschpolec E
  • Rao M
 et al. 
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Abstract

Implementation of CoWP metal caps into Cu/low-k integration schemes requires a wet stripper that not only gives efficient cleaning but also has good compatibility to CoWP and low-k dielectrics. This paper describes a novel non-fluoride CoWP compatible stripper, developed based on a systematic study of the effect of stripper components, i.e. solvent, corrosion inhibitor, and stripper pH. Electrochemical methods were used to characterize galvanic corrosion of the CoWP/Cu couple and to estimate CoWP etch rate. Our studies showed that a traditional fluoride stripper caused severe damage to CoWP capping layer. The new stripper achieved a good balance between cleaning efficiency and compatibility to CoWP and low-k dielectrics, and demonstrated significant advantages in electrical properties over the traditional fluoride stripper. © 2009 Elsevier B.V. All rights reserved.

Author-supplied keywords

  • CoWP compatibility
  • CoWP/Cu galvanic corrosion
  • Cu/low-k integration
  • Porous low-k compatibility
  • Wet-clean stripper

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Authors

  • Aiping Wu

  • Eugene Baryschpolec

  • Madhukar Rao

  • Matthias Schaller

  • Christin Bartsch

  • Susanne Leppack

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