The p+-gridded MNOS capacitor was fabricated to facilitate the study of the effects of Write/Erase cycling and of varying the processing parameters on the interface-state density in an MNOS nonvolatile memory device. A model is derived for this device, which enables the extraction of the device parameters using the quasi-static C-V (QSCV) technique. The distribution of the interface-state density across the forbidden energy gap of silicon was deduced from QSCV measurements. Interface-state density minima between 1.8 × 1011and 9.1 × 1011eV-1cm-2near the silicon midgap were obtained. The effects of processing variations on the Si/SiO2interface-state density distribution and the retention characteristics of the MNOS were studied. © 1986.
de Almeida, A. M., & Li, S. S. (1986). Effects of varying the processing parameters on the interface-state density and retention characteristics of an MNOS capacitor. Solid State Electronics, 29(6), 619–624. https://doi.org/10.1016/0038-1101(86)90143-7