The formation of crack-free MoSi ya-Si N composite coating on a Mo substrate by ammonia nitridation followed by chemical vapor deposition (CVD) of Si on the Mo Si layer at 1100 8C which was already formed on a Mo substrate was investigated 5 3 using optical microscopy, field-emission scanning electron microscopy (SEM), cross-sectional transmission electron microscopy (XTEM) and X-ray diffraction (XRD). This study demonstrated that the crack-free MoSi2/α-Si3N4composite coating with some pores could be produced on a Mo substrate. Two composite layers (y-Mo2N/α-Si3N4and Mo3Si/α-Si3N4) with different microstructure were formed by ammonia nitridation of Mo5Si3layer, and the subsequent CVD of Si resulted in the formation of 5 3 three composite layers (MoSi2/oblate-spheroidal type α-Si3N4, y-Mo2N/rod type α-Si3N4and Mo3Si/α-Si3N4).
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