Formation of crack-free MoSi2/α-Si3N4composite coating on Mo substrate by ammonia nitridation of Mo5Si3layer followed by chemical vapor deposition of Si

  • Yoon J
  • Kim G
  • Byun J
 et al. 
  • 1

    Readers

    Mendeley users who have this article in their library.
  • 14

    Citations

    Citations of this article.

Abstract

The formation of crack-free MoSi ya-Si N composite coating on a Mo substrate by ammonia nitridation followed by chemical vapor deposition (CVD) of Si on the Mo Si layer at 1100 8C which was already formed on a Mo substrate was investigated 5 3 using optical microscopy, field-emission scanning electron microscopy (SEM), cross-sectional transmission electron microscopy (XTEM) and X-ray diffraction (XRD). This study demonstrated that the crack-free MoSi2/α-Si3N4composite coating with some pores could be produced on a Mo substrate. Two composite layers (y-Mo2N/α-Si3N4and Mo3Si/α-Si3N4) with different microstructure were formed by ammonia nitridation of Mo5Si3layer, and the subsequent CVD of Si resulted in the formation of 5 3 three composite layers (MoSi2/oblate-spheroidal type α-Si3N4, y-Mo2N/rod type α-Si3N4and Mo3Si/α-Si3N4).

Author-supplied keywords

  • Ammonia nitridation and CVD of Si
  • Crack-free MoSi2/α-Si3N4composite coating
  • Molybdenum

Get free article suggestions today

Mendeley saves you time finding and organizing research

Sign up here
Already have an account ?Sign in

Find this document

Authors

  • Jin Kook Yoon

  • Gyeung Ho Kim

  • Ji Young Byun

  • Jong Kwon Lee

Cite this document

Choose a citation style from the tabs below

Save time finding and organizing research with Mendeley

Sign up for free