Influence of UV light irradiation on film thickness distribution of tin oxide films by photochemical vapour deposition

  • Tamura S
  • Ishida T
  • Magara H
 et al. 
  • 3


    Mendeley users who have this article in their library.
  • 7


    Citations of this article.


Tin oxide (non-doped) films have been prepared by a photochemical vapour deposition (photo-CVD) from Tetramethyltin (TMT) (Sn(CH3)4) and O2(containing O3). A low-pressure mercury lamp was used as the light source. The effect of the UV light irradiation on the film thickness distribution along 5 cm×5 cm area was examined. By piling Teflon films on the surface of the suprasil window, the light intensity of 184.9 nm UV wavelength of the low-pressure mercury lamp was controlled, while that of 253.7 nm wavelength through the Teflon hardly changed. As a result, the uniformity of the film thickness distribution was improved as the light intensity (184.9 nm) increased. The UV 184.9 nm light irradiation may have improved the uniformity of the reactive species distribution in the vapour phase, which may result in the formation of the uniform thickness distribution.

Get free article suggestions today

Mendeley saves you time finding and organizing research

Sign up here
Already have an account ?Sign in

Find this document


  • S. Tamura

  • T. Ishida

  • H. Magara

  • T. Mihara

  • S. Mochizuki

  • T. Tatsuta

Cite this document

Choose a citation style from the tabs below

Save time finding and organizing research with Mendeley

Sign up for free