Interaction of the atomic hydrogen with Si(111) 3 × 3-Al surface: LEED and AES results

  • Saranin A
  • Khramtsova E
  • Lifshits V
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Abstract

Using LEED and AES the RT structural transformations from Si(111) 3 × 3-Al to Si(111)1 × 1-(A1, H) induced by atomic hydrogen has been studied. It has been found that transformation kinetics is determined by the exposure time and does not depend on the pressure during exposure. Upon heating at temperatures above 700°C the 3 × 3-Al structure reappears, but the Al coverage is always less than the original coverage. Isothermal desorption of Al from the Si(111) 3 × 3-Al structure has been studied. It has been shown that Al desorption does not produce noticeable effect on the Al coverage in the reappeared 3 × 3 structure. It has been concluded that a fall in Al coverage is determined not by the formation of the volatile Al-hydride but rather by the interaction of uncontrollable contaminants (oxygen-containing molecules) with aluminum. © 1994.

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