Interdiffusion and amorphization in Ni/Ti multilayers

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Abstract

Diffusion was studied in (fcc) Ni / (hcp) Ti multilayers in the temperature range 453 - 513 K by using low angle X-ray scattering (LAXS). Diffusion coefficients ranging from 0.6 10-24 to 7 10-24 m2s-1 were obtained for multilayers with a composition modulation wavelength of 35, 80 and 110 Å. These measurements suggest diffusion induced solid state amorphization reaction (SSAR) with a low activation energy. It was observed that amorphization does not follow entirely the layer growth model. © 1991.

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Bouhki, M., Bruson, A., & Guilmin, P. (1991). Interdiffusion and amorphization in Ni/Ti multilayers. Solid State Communications, 79(5), 389–393. https://doi.org/10.1016/0038-1098(91)90490-M

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