Interstitial loop growth in HVEM-irradiated nickel foils

  • Miller K
  • 2

    Readers

    Mendeley users who have this article in their library.
  • 1

    Citations

    Citations of this article.

Abstract

A recently presented model for the development of a dislocation density in HVEM-irradiated thin foils has been applied to nickel. From matching the results to previously reported experimental measurements of loop radius growth as a function of position in the foil, the dislocation bias and vacancy migration energy in nickel have been determined. A comparison has been carried out of the effect on the results of using two distinct sink strengths to model the flow of defects to the dislocation loops. Equally good fits to the experimental data have been obtained with either sink strength and consequently it has not proved possible to select a preferable representation for the loops. © 1983.

Get free article suggestions today

Mendeley saves you time finding and organizing research

Sign up here
Already have an account ?Sign in

Find this document

Authors

  • K. M. Miller

Cite this document

Choose a citation style from the tabs below

Save time finding and organizing research with Mendeley

Sign up for free