Investigations on cubic Ti(B,N) films prepared by reactive diode R.F. sputtering from a TiB2target

  • Selbach E
  • Schmidt K
  • Wang M
  • 1


    Mendeley users who have this article in their library.
  • 23


    Citations of this article.


The preparation of cubic Ti(B,N) films by reactive diode sputtering is repoted. The structure and the composition of the films were determined by transmission electron diffraction, Rutherford backscattering and the nuclear reaction11B (p,α)9Be. The determination of mechanical properties such as microhardness and intrinsic stress was performed with an ultralow load indentation and a surface profilometer respectively. © 1990.

Get free article suggestions today

Mendeley saves you time finding and organizing research

Sign up here
Already have an account ?Sign in

Find this document


  • E. Selbach

  • K. Schmidt

  • M. Wang

Cite this document

Choose a citation style from the tabs below

Save time finding and organizing research with Mendeley

Sign up for free