The preparation of cubic Ti(B,N) films by reactive diode sputtering is repoted. The structure and the composition of the films were determined by transmission electron diffraction, Rutherford backscattering and the nuclear reaction11B (p,α)9Be. The determination of mechanical properties such as microhardness and intrinsic stress was performed with an ultralow load indentation and a surface profilometer respectively. © 1990.
Selbach, E., Schmidt, K., & Wang, M. (1990). Investigations on cubic Ti(B,N) films prepared by reactive diode R.F. sputtering from a TiB2target. Thin Solid Films, 188(2), 267–274. https://doi.org/10.1016/0040-6090(90)90289-P