An optical projection system has been developed which allows patterning of both layer thickness and donor concentration in epitaxial films of ZnSe during growth by molecular beam epitaxy. Doping features with a period as small as 40 μ m have been produced and it appears possible to reduce this by at least one order of magnitude. Such in-situ techniques may be valuable for the fabrication of more sophisticated devices than are currently being produced from the wide-gap II-VI compounds. © 1994.
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