The phenomenon of metastable phase formation during a constant temperature and constant pressure thin film reaction is explained by a kinetic model emphasizing the rate of transition. It is assumed that the reaction obeys a maximum time-dependent rather than time-independent negative free energy change. The product persists in the metastable state due to a high activation barrier to later transition. © 1991.
Tu, K. N. (1991). Metastable phase formation in thin film reactions. Materials Science and Engineering A, 134(C), 1244–1247. https://doi.org/10.1016/0921-5093(91)90965-P