Model-based control in rapid thermal processing

Abstract

In single wafer rapid thermal processing (RTP), the process recipe is characterized by high ramp rates and short high temperature holds. In this paper, the development of temperature control algorithms for the RTP process is discussed. A model-based controller based on a physically-based macroscopic model developed from first principles is presented. The model-based controller is compared to an empirically determined controller and is shown to perform favorably towards meeting very stringent specifications.