Molecular beam epitaxy of CuCl films on mica

  • Wong H
  • Gu S
  • Wong G
 et al. 
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Abstract

Molecular beam epitaxy of pure CuCl films on mica was studied for various substrate temperatures (16-250 °C). Both the transmission Laue method and diffractometer methods were used to characterize the films. All films showed the [111] zinc blende texture but only those films prepared at about 150 °C showed excellent, though twinned, epitaxy. © 1982.

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Authors

  • H. K. Wong

  • S. J. Gu

  • G. K. Wong

  • J. B. Ketterson

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