Monte Carlo simulation of the PVD transport process for alloys

Citations of this article
Mendeley users who have this article in their library.
Get full text


Using three-dimensional Monte Carlo methods the transport of sputtered material in a PVD process was simulated for single element and alloy targets. The aim of the simulation was to calculate the thickness distribution of the deposited films on complex substrates as well as the kinetic properties of the deposited particles. The results of the simulations were compared with experimentally processed films. © 2005 Elsevier B.V. All rights reserved.




Lugscheider, E., Bobzin, K., Papenfuß-Janzen, N., & Parkot, D. (2005). Monte Carlo simulation of the PVD transport process for alloys. Surface and Coatings Technology, 200(1-4 SPEC. ISS.), 913–915.

Register to see more suggestions

Mendeley helps you to discover research relevant for your work.

Already have an account?

Save time finding and organizing research with Mendeley

Sign up for free