Nano-crystalline Zr2ON2 thin films deposited by reactive magnetron sputtering

15Citations
Citations of this article
8Readers
Mendeley users who have this article in their library.
Get full text

Abstract

Zirconium oxynitride films were deposited by RF reactive magnetron sputtering in water vapor-nitrogen atmosphere varying the deposition temperature from RT to 600 °C. The influence of the substrate temperature on the films physical properties was investigated. The obtained films quality was evaluated using optical analysis, X-ray diffraction, X-photoelectron spectroscopy, and Secondary Ion mass spectroscopy. It was found that the variation of the substrate temperature from RT to 600 °C caused the transition from cubic phase of Zr2ON2 to ZrN one, as confirmed by TEM observations. In particular, a co-presence of Zr3N4-ZrN was detected when the deposition was performed at 400 °C. Moreover, Forouhi-Bloomer dispersion equations for extinction coefficient (k) and deconvolution of XPS spectra are utilized to further elucidate chemical structure. © 2009 Elsevier B.V. All rights reserved.

Cite

CITATION STYLE

APA

Rizzo, A., Signore, M. A., Mirenghi, L., Cappello, A., & Tapfer, L. (2010). Nano-crystalline Zr2ON2 thin films deposited by reactive magnetron sputtering. Surface and Coatings Technology, 204(12–13), 2019–2022. https://doi.org/10.1016/j.surfcoat.2009.10.031

Register to see more suggestions

Mendeley helps you to discover research relevant for your work.

Already have an account?

Save time finding and organizing research with Mendeley

Sign up for free