Optical effects in silica glass during implantation of 60 keV Cu - ions

  • Plaksin O
  • Takeda Y
  • Kono K
 et al. 
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Abstract

Spectra of the optical transmission and ion-induced photon emission (IIPE) of silica glass were measured during implantation of 60 keV Cu-ions at ion fluxes from 1 to 75 μA/cm2up to a fluence of 2 × 1017ions/cm2, aimed at monitoring the formation of Cu nanoparticles. The precipitation threshold of Cu atoms is flux-dependent. At fluxes from 1 to 10 μA/cm2, the formation of nanoparticles is efficient up to fluences of 2 × 1017ions/cm2. The efficiency of IIPE of Cu+solutes in silica glass (band at 2.25 eV) is proportional to a total concentration of Cu solutes. In a single-phase region (solid solution of Cu atoms), the efficiency of IIPE of Cu+solutes is flux-independent. In a two-phase region (solid solution and Cu nanoparticles), the dynamic balance between the nanoparticles and Cu solutes determines the flux-dependent behavior of the efficiency of IIPE. © 2004 Elsevier B.V. All rights reserved.

Author-supplied keywords

  • Heavy-ion implantation
  • In situ optical transmission
  • Ion-induced photon emission
  • Metal nanoparticles
  • Silica glass

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