Latent image concentration gradients are examined for the purpose of selecting photoresist exposure dose to optimize lithographic process latitudes. This is treated for the general case where multi-functional photoactive compounds are present in the resist and there is a supralinear relationship between dissolution rate and dose. Results are compared with two resist systems for which the process photospeed has been varied, one with a low qeffand another with a qeff>5. © 1991.
Trefonas, P., Fisher, T. A., & Lachowski, J. (1991). What is the optimum exposure dose for a positive resist containing poly-functional photoactive compound? Microelectronic Engineering, 13(1–4), 109–114. https://doi.org/10.1016/0167-9317(91)90059-M