Latent image concentration gradients are examined for the purpose of selecting photoresist exposure dose to optimize lithographic process latitudes. This is treated for the general case where multi-functional photoactive compounds are present in the resist and there is a supralinear relationship between dissolution rate and dose. Results are compared with two resist systems for which the process photospeed has been varied, one with a low qeffand another with a qeff>5. © 1991.
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