What is the optimum exposure dose for a positive resist containing poly-functional photoactive compound?

2Citations
Citations of this article
1Readers
Mendeley users who have this article in their library.
Get full text

Abstract

Latent image concentration gradients are examined for the purpose of selecting photoresist exposure dose to optimize lithographic process latitudes. This is treated for the general case where multi-functional photoactive compounds are present in the resist and there is a supralinear relationship between dissolution rate and dose. Results are compared with two resist systems for which the process photospeed has been varied, one with a low qeffand another with a qeff>5. © 1991.

Cite

CITATION STYLE

APA

Trefonas, P., Fisher, T. A., & Lachowski, J. (1991). What is the optimum exposure dose for a positive resist containing poly-functional photoactive compound? Microelectronic Engineering, 13(1–4), 109–114. https://doi.org/10.1016/0167-9317(91)90059-M

Register to see more suggestions

Mendeley helps you to discover research relevant for your work.

Already have an account?

Save time finding and organizing research with Mendeley

Sign up for free