Oxygen-plasma treatment for low-temperature processing of lead-zirconate-titanate thin films

  • Park E
  • Jang H
  • Kang E
 et al. 
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Abstract

Low-temperature processing of ferroelectric thin films has remained a major barrier to their practical applications. In this work, RF and microwave oxygen-plasma treatment has been employed for low-temperature processing of ferroelectric thin films of sol-gel-derived Pb(Zrx,Ti1-x)O3 (PZT). The as-coated PZT films were annealed in oxygen ambience at 450-°C. Subsequent RF oxygen-plasma treatment at 200 and 300-°C resulted in fair ferroelectric hystereses. Besides, room-temperature microwave oxygen-plasma treatment gave rise to remanent polarizations as large as 15-μC/cm2. © 2005 Elsevier Ltd. All rights reserved.

Author-supplied keywords

  • A. Thin films
  • B. Epitaxial growth
  • C. Photoelectron spectroscopy
  • D. Ferroelectricity

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Authors

  • Eung Ryul Park

  • Hyuk Kyoo Jang

  • Eung Kil Kang

  • Cheol Eui Lee

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