BiSrCaCuO films (0.3 to 1.5 μm) were successfully prepared on MgO (100) substrate, using a simple dc single target sputtering system with a pure Ar plasma, and post-deposition annealing. A first drop of the resistance versus T is observed at 110-120 K; the main transition occurs at 85 K with zero resistance at 80 K. Films are characterized by X ray diffraction, RBS and SEM analysis. © 1988.
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