Profile measurement of a wide-area resist surface using a multi-ball cantilever system

  • Liu S
  • Watanabe K
  • Chen X
 et al. 
  • 1


    Mendeley users who have this article in their library.
  • 14


    Citations of this article.


In the semiconductor industry, a device that can measure the surface profile of thin film like photoresist with high accuracy and high speed is needed. Since the surface of photoresist is very smooth and deformable, a device is required that will measure vertically with nanometer resolution and not damage the film during the measurement. We developed an apparatus using a multi-ball cantilever and white light interferometer to measure the surface profile of thin film. However, this system, as assessed with a scanning method, suffers from the presence of a moving stage and systematic sensor errors. Therefore, this paper describes an approach using a multi-ball cantilever as coupled distance sensors together with an autocollimator as an additional angle measuring device, which has the potential for self-calibration of a multi-ball cantilever. Using this method, we constructed an experimental apparatus and made measurements on resist film. The results demonstrated the feasibility of the constructed multi-ball cantilever system with the autocollimator for measuring thin film with high accuracy. © 2008 Elsevier Inc. All rights reserved.

Author-supplied keywords

  • Multi-ball cantilever
  • Photoresist measurement
  • Self-calibration
  • White light interferometer
  • Wide-area measurement

Get free article suggestions today

Mendeley saves you time finding and organizing research

Sign up here
Already have an account ?Sign in

Find this document


Cite this document

Choose a citation style from the tabs below

Save time finding and organizing research with Mendeley

Sign up for free