Structures of the initial stage of Fe silicide grown on Si(1 1 1) by reactive deposition epitaxy method are studied by reflection high-energy electron diffraction and scanning tunneling microscopy. At the beginning, triangular two-dimensional Fe silicide islands of a 2 × 2 structure appear. During iron deposition, they grow and part of them stick to each other, while their flatness and periodic structure remain unchanged. At multilayer coverage, a diffraction pattern due to three-dimensional islands appears. This is considered to be a new Fe silicide phase as a precursor of β-FeSi2. © 2002 Elsevier Science B.V. All rights reserved.
Minami, N., Makino, D., Matsumura, T., Egawa, C., Sato, T., Ota, K., & Ino, S. (2002). RHEED-STM study of iron silicide structures on Si(1 1 1). In Surface Science (Vol. 514, pp. 211–215). https://doi.org/10.1016/S0039-6028(02)01631-X