RHEED-STM study of iron silicide structures on Si(1 1 1)

  • Minami N
  • Makino D
  • Matsumura T
 et al. 
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Abstract

Structures of the initial stage of Fe silicide grown on Si(1 1 1) by reactive deposition epitaxy method are studied by reflection high-energy electron diffraction and scanning tunneling microscopy. At the beginning, triangular two-dimensional Fe silicide islands of a 2 × 2 structure appear. During iron deposition, they grow and part of them stick to each other, while their flatness and periodic structure remain unchanged. At multilayer coverage, a diffraction pattern due to three-dimensional islands appears. This is considered to be a new Fe silicide phase as a precursor of β-FeSi2. © 2002 Elsevier Science B.V. All rights reserved.

Author-supplied keywords

  • Epitaxy
  • Iron
  • Low index single crystal surfaces
  • Reflection high-energy electron diffraction (RHEED)
  • Scanning tunneling microscopy
  • Silicides
  • Silicon

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Authors

  • N. Minami

  • D. Makino

  • T. Matsumura

  • C. Egawa

  • T. Sato

  • K. Ota

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