Study of the surface activation of ETFE by low energy (keV) Si and N bombardment

  • Parada M
  • De Almeida A
  • Muntele C
 et al. 
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Abstract

The ethylenetetrafluoroethylene (ETFE) is a polymer formed by alternating ethylene and tetrafluoroethylene segments. It can be applied in the field of medical physics as intra venous catheters and as radiation dosimeters. The increasing application of polymeric materials in technological and scientific fields has motivated the use of surface treatments to modify the physical and chemical properties of polymer surfaces. When a material is exposed to ionizing radiation, it suffers damage leading to surface activation depending on the type, energy and intensity of the applied radiation. In order to determine the radiation damage and the surface activation mechanism ETFE films were bombarded with keV Si and N at various fluences. The bombarded film was also analyzed with optical absorption photospectrometry (OAP), Raman and Fourier transform infrared-attenuated total reflectance (FTIR-ATR) spectroscopy showing quantitatively the chemical nature at the damage caused by the Si and N bombardment. © 2005 Elsevier B.V. All rights reserved.

Author-supplied keywords

  • ETFE
  • Ion implantation
  • Radiation damage

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