Texture in cobalt films deposited obliquely by sputtering

Citations of this article
Mendeley users who have this article in their library.
Get full text


The texture in cobalt films deposited obliquely by sputtering was investigated by analysing the magnetic anisotropy in addition to the X-ray analysis. The incidence angle was 45° and the substrate temperature was 332 K. The film thickness ranged from 0.4 to 3.8 μm. The {0002}, {1120}, {1011} and {1011} pole figures obtained by the X-ray Schulz method showed that crystallites in the film have two preferential axes: the [1120] direction of most crystallites lies in a direction in the incidence plane and the [0001] direction points in the direction perpendicular to the incidence plane. The thickness dependence of the magnetic anisotropy indicated that the same type of two-degree orientation exists irrespective of thickness. However, the degree of orientation becomes low with decreasing thickness. The depth profiling of the magnetic anisotropy revealed that the texture evolved in a thin film remains at the lower part of the thick film. © 1994.




Itoh, K., Hara, K., Kamiya, M., Okamoto, K., Hashimoto, T., & Fujiwara, H. (1994). Texture in cobalt films deposited obliquely by sputtering. Journal of Magnetism and Magnetic Materials, 134(1), 199–207. https://doi.org/10.1016/0304-8853(94)90093-0

Register to see more suggestions

Mendeley helps you to discover research relevant for your work.

Already have an account?

Save time finding and organizing research with Mendeley

Sign up for free