Visualization of the development process in deep X-ray lithography

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Abstract

In this work the contour visualization method of developed high aspect ratio microstructures with any lateral size of ∼1 μm in thick PMMA layers using normal and tilted SR exposure is proposed in order to investigate the microstructures behaviour and the development process. This method can be also applied in situ during the development process. © 2009.

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Nazmov, V., Mohr, J., & Reznikova, E. (2009). Visualization of the development process in deep X-ray lithography. Nuclear Instruments and Methods in Physics Research, Section A: Accelerators, Spectrometers, Detectors and Associated Equipment, 603(1–2), 153–156. https://doi.org/10.1016/j.nima.2008.12.148

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