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Iacopo Mochi

  • Paul Scherrer Institute
  • 15h-indexImpact measure calculated using publication and citation counts. Updated daily.
  • 701CitationsNumber of citations received by Iacopo's publications. Updated daily.

Other IDs

Co-authors (265)

  • Maurizio Vannoni

Publications (5)

  • A two-step method for fast and reliable EUV mask metrology

    • Helfenstein P
    • Mochi I
    • Rajendran R
    • et al.
    N/AReaders
    0Citations
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  • Coherent diffractive imaging methods for semiconductor manufacturing

    • Helfenstein P
    • Mochi I
    • Rajeev R
    • et al.
    N/AReaders
    0Citations
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  • Lithographic performance of ZEP520A and mr-PosEBR resists exposed by electron beam and extreme ultraviolet lithography

    • Fallica R
    • Kazazis D
    • Kirchner R
    • et al.
    N/AReaders
    0Citations
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  • State-of-the-art EUV materials and processes for the 7nm node and beyond

    • Buitrago E
    • Meeuwissen M
    • Yildirim O
    • et al.
    N/AReaders
    0Citations
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  • Towards a stand-alone high-throughput EUV actinic photomask inspection tool: RESCAN

    • Rajendran R
    • Mochi I
    • Helfenstein P
    • et al.
    N/AReaders
    2Citations
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Professional experience

Paul Scherrer Institut