We report for the first time deposition of aluminium oxide thin films by APGD, plasma-enhanced CVD. This approach allows deposition at substantially lower substrate temperatures than normally used in atmospheric pressure based processing. The films are analysed by SEM, XPS, RBS, XRD, and optical properties. It is demonstrated that the APGD approach yields films which are essentially smooth, conformal and free from pinholes or other imperfections. © 2006 Wiley-VCH Verlag GmbH & Co. KGaA, Weinheim.
Mendeley saves you time finding and organizing research
Choose a citation style from the tabs below