Characterization of MgZnO films grown by plasma enhanced metal-organic chemical vapor deposition

  • Asahara H
  • Takamizu D
  • Inokuchi A
 et al. 
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Abstract

MgZnO (magnesium-zinc-oxide) films were grown on (11-20) sapphire substrates and Zn-polar ZnO substrates by plasma enhanced metal-organic chemical vapor deposition (PE-MOCVD) employing microwave-excited plasma. Structural, electrical and optical properties were investigated by X-ray diffraction, atomic force microscope, Hall, transmittance and photoluminescence measurement. The c-axis lattice constant decreases proportionally to an increase in the Mg content of Mg(x)Zn(1-x)O films. Therefore, this indicates that Mg atoms can be substituted in the Zn sites. Mg contents in films on ZnO substrates increase up to 0.11. In addition, Ga doped ZnO films were grown on (11-20) sapphire substrates. The resistivity of the films on (11-20) sapphire is controlled between 1.2 x 10(-3) Omega cm to 1 Omega cm by changing the process conditions. The overall results indicate the promising potential of this PE-MOCVD method for related (Zn, Mg)O films formation because of the reactivity of the radicals, such as oxygen radicals (O*). (C) 2009 Elsevier B.V. All rights reserved.

Author-supplied keywords

  • gallium doped zinc oxide
  • homoepitaxial growth
  • magnesium-zinc-oxide
  • modulation of band gap
  • phase epitaxy
  • plasma enhanced metal-organic chemical vapor depos
  • substitution
  • zno

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Authors

  • H Asahara

  • D Takamizu

  • A Inokuchi

  • M Hirayama

  • A Teramoto

  • S Saito

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