Abstract
Various aspects are covered including the basic CVD process, the range of materials produced, the chemistry of CVD, properties of CVD deposits, comparison with other coating techniques, applications and future developments.
Cite
CITATION STYLE
APA
N.j. Archer. (1979). Chemical vapour deposition. Physics in Technology, 10(4), 152–161. https://doi.org/10.1088/0305-4624/10/4/I03
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