Computer simulations of resist profiles in x-ray lithography

  • Heinrich K
  • 1


    Mendeley users who have this article in their library.
  • 26


    Citations of this article.


A detailed study is presented on computer simulations of resist profiles obtained in X-ray lithography for exposures made either with synchrotron radiation or with an Al-K// alpha source. It is assumed, for purposes of the calculations, that the vacuum windows consist of kapton and that silicon is used as the mask material. The influence of edge shape and mask absorber thickness upon the resist structure is of special interest. The other parameters affecting resist profiles, such as Fresnel diffraction (especially in the case of semitransparent absorbers) and photoelectron range, are taken into consideration. In the case of the X-ray tube, the penumbral blur caused by the finite dimensions of the source spot leads to an additional deterioration of the edge sharpness.

Get free article suggestions today

Mendeley saves you time finding and organizing research

Sign up here
Already have an account ?Sign in

Find this document

Get full text


  • K. Heinrich

Cite this document

Choose a citation style from the tabs below

Save time finding and organizing research with Mendeley

Sign up for free