Crystallization behavior of thin ALD-Al2O3 films

  • Jakschik S
  • Schroeder U
  • Hecht T
 et al. 
  • 92

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Abstract

Integration of materials with a high dielectric constant into storage or gate capacitor applications requires a detailed understanding of the crystallization behavior. The dependence of crystallinity on annealing temperature and time was studied for thin atomic-layer-deposited (ALD) Al2O3 films of varying thickness, using grazing-incidence X-ray diffraction. The correlation between dielectric constant and annealing condition was investigated and an increase in dielectric constant due to annealing was observed. © 2002 Elsevier Science B.V. All rights reserved.

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Authors

  • Stefan Jakschik

  • Uwe Schroeder

  • Thomas Hecht

  • Martin Gutsche

  • Harald Seidl

  • Johann W. Bartha

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