The effect of applied substrate negative bias voltage on the structure and properties of Al-containing a-C:H thin films

  • Zhang G
  • Yan P
  • Wang P
 et al. 
  • 19


    Mendeley users who have this article in their library.
  • 26


    Citations of this article.


Al-containing hydrogenated amorphous carbon (Al-C:H) films were prepared using a magnetron sputtering Al target in the CH4and Ar mixture atmosphere with various applied substrate pulse negative bias voltages. The hydrogen content and internal stress of the film decrease dramatically with the substrate pulse bias voltage increase. However, the hardness values of the films keep at high level (∼ 20 GPa) without any obvious changes with the increase of the applied substrate pulse bias voltages. The Al-C:H film prepared at applied substrate high bias voltage shows a long wear life and low friction coefficient. © 2007 Elsevier B.V. All rights reserved.

Author-supplied keywords

  • 62.20.-x
  • 62.20.Qp
  • 68.35.Gy
  • 81.40.Pq
  • 87.15.La
  • Al-containing hydrogenated amorphous carbon
  • Applied substrate pulse bias
  • Hardness
  • Magnetron sputtering
  • Wear test

Get free article suggestions today

Mendeley saves you time finding and organizing research

Sign up here
Already have an account ?Sign in

Find this document

Get full text


  • Guangan Zhang

  • Pengxun Yan

  • Peng Wang

  • Youming Chen

  • Junying Zhang

  • Liping Wang

Cite this document

Choose a citation style from the tabs below

Save time finding and organizing research with Mendeley

Sign up for free