Electron diffraction with ten nanometer beam size for strain analysis of nanodevices

  • Armigliato A
  • Frabboni S
  • Gazzadi G
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Abstract

A method to perform nanobeam diffraction (NBD) in a transmission
electron microscope with high spatial resolution and low convergence
angle is proposed. It is based on the use of a properly fabricated
condenser aperture of 1 mu m in diameter, which allows an electron
beam about 10 nm in size to be focused on the sample, with a convergence
angle in the 0.1 mrad range. Examples of NBD patterns taken in an
untilted < 110 > cross section of a silicon device are shown. Their
quality is adequate for spot position determination and hence to
obtain, in principle, quantitative strain information. (C) 2008 American
Institute of Physics. {[}DOI: 10.1063/1.3003581]

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Authors

  • A. Armigliato

  • S. Frabboni

  • G. C. Gazzadi

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