Fundamental proximity effects in focused electron beam induced deposition.

  • Proximity F
  • Electron F
  • Induced B
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Fundamental proximity effects for electron beam induced deposition processes on nonflat surfaces were studied experimentally and via simulation. Two specific effects were elucidated and exploited to considerably increase the volumetric growth rate of this nanoscale direct write method: (1) increasing the scanning electron pitch to the scale of the lateral electron straggle increased the volumetric growth rate by 250% by enhancing the effective forward scattered, backscattered, and secondary electron coefficients as well as by strong recollection effects of adjacent features; and (2) strategic patterning sequences are introduced to reduce precursor depletion effects which increase volumetric growth rates by more than 90%, demonstrating the strong influence of patterning parameters on the final performance of this powerful direct write technique.

Author-supplied keywords

  • Chemical
  • Computer Simulation
  • Crystallization
  • Crystallization: methods
  • Electrons
  • Electroplating
  • Electroplating: methods
  • Heavy Ions
  • Macromolecular Substances
  • Macromolecular Substances: chemistry
  • Macromolecular Substances: radiation effects
  • Materials Testing
  • Models
  • Molecular Conformation
  • Molecular Conformation: radiation effects
  • Monte Carlo simulation
  • Nanostructures
  • Nanostructures: chemistry
  • Nanostructures: radiation effects
  • Particle Size
  • Surface Properties
  • Surface Properties: radiation effects
  • electron beam induced deposition
  • nanotechnology
  • patterning
  • platinum

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  • Fundamental Proximity

  • Focused Electron

  • Beam Induced

  • Harald Plank

  • Daryl A. Smith

  • Thomas Haber

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